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News


September 2006
Substrate Heating for compact systems
In response to customer demand, Wordentec has introduced a compact substrate holder that features rotation and heating.
The substrate holder was designed for the RND system but can be retrofitted to other process chambers including the S400 system. It can be fitted with a variety of bayonet mounting substrate carriers to accommodate samples up to 150 mm in diameter. The rotation mechanism provides variable speed substrate rotation and is equipped with a Ferrotec ferrofluid vacuum seal. The rotating substrate can be heated using a PID controlled element. The unit can be fitted with an optional temperature set-point programmer.
The maximum operating temperature is 500 deg C.
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