|In response to customer demand, Wordentec has introduced a compact substrate holder that features rotation and heating. |
The substrate holder was designed for the RND system but can be retrofitted to other process chambers including the S400 system. It can be fitted with a variety of bayonet mounting substrate carriers to accommodate samples up to 150 mm in diameter. The rotation mechanism provides variable speed substrate rotation and is equipped with a Ferrotec ferrofluid vacuum seal. The rotating substrate can be heated using a PID controlled element. The unit can be fitted with an optional temperature set-point programmer.
The maximum operating temperature is 500 deg C.
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