The WAVE 800 EBeam Evaporator
At the heart of the WAVE800 system is a process chamber that is geometrically identical to the original Balzers BAK 760.
The chamber includes additional features consistent with modern instrumentation yet remains fully compatible with existing 760 tooling and accessories.
The WAVE control system handles process recipe editing and execution plus full system parameter datalogging.
The WAVE system has an embedded Inficon quartz crystal measurement system compatible with single or multiple crystals.
WAVE communicates with a wide range of system components via an industrial field bus system together with RS232 and ethernet comms to ensure precise layer thickness and rate, excellent uniformity, and a superior production yield
The all new WAVE 800 for precision optical thin film coatings
Dual source configuration
Source Specification | Source 1 | Ferrotec EV M10 (8 crucibles) |
| Source 2 | Ferrotec EV M10 (single crucible) |
| Power Supply | Ferrotec Carrera 6 |
| Source Controller | Genius PRO |
Dimensions | Chamber Size L x W x H | 950mm x 888mm x 923mm |
| Substrate Carrier | 800mm |
| Source to Substrate | 696mm |
Wafer Guide | Maximum number 4" (101.6mm) wafers | 40 |
| Maximum number 5" (127.0mm) wafers | 30 |
| Maximum number 6" (152.4mm) wafers | 24 |
| Maximum number 8" (203.2mm) wafers | 8 |
Performance | High Vacuum Pump | OnBoard 400 cryo pump |
| Pump down time | 10 minutes |
| Ultimate Pressure | 5.0 x10E-08 |
| Maximum Temperature | 300 degrees max |
| Chamber Cooling | 7 channel with heating |
