System Upgrade BAS 450
Up to 3 planar magnetron cathodes 5” x 10”
· Substrate Heating
Available from stock, the BAS 450PM coating system.
Capacity
- 24 3-inch substrates
- 9 4-inch substrates
- 8 125 mm Pseudo Square
The cylindrical processing chamber with a diameter of 445 mm and a
height of 500 mm is made of stainless steel. The outside of the
chamber is fitted with brazed-on half round pipes for heating and
cooling. In addition to a sight glass in the front of the chamber,
there are other ports for fitting the gas inlet and feedthroughs for the anodes. The processing chamber has 4 flanges for mounting the
planar magnetron cathodes and the substrate heaters.
"Economical spuutering plant for research, development and small scale production"
Source Specification Source 1 | 127x 254mm |
Source 2 | 127x 254mm |
Power Supply | |
Source Controller | |
Dimensions Chamber Size L x W x H | 445x500 |
Substrate Carrier | drum coater |
Source to Substrate | |
Performance High Vacuum Pump | Diffusion |
Pump down time | 1.0E-06 |
Ultimate Pressure | |
Maximum Temperature | 300 max |
Chamber Cooling | 4 channel |